In principle, the pressure of one process chamber can control the input of regulating gas. Although this method is applicable to a variety of applications, increasingly demanding semiconductor processes require control of gas flow and pressure of mutually independent processes.

Has anyone reminded you that during the transportation of the electric three-way regulating valve, it is necessary to fix it with a bracket to prevent loosening? Will anyone tell you that when installing some parts of the ball valve, such as the valve positioner, its firm work is more important, which can effectively prevent the feedback rod and other parts from being damaged by external forces?